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Intel passes one million High-NA EUV wafers, studies larger masks

ASML EUV machine

Image: Primary

Tuesday, September 8, 2026 · 6:00 AM UTC

Intel said it has processed more than one million 300-mm wafers on High-NA EUV scanners, including installation, certification, R&D and production work. The company certified the tools for its 18A process earlier this year and says they now make some Panther Lake processors. Intel is also working on 6×12-inch photomasks to avoid field stitching, though neither it nor ASML has confirmed whether existing or planned scanners can accommodate them.

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Published by Tech & Business, a media brand covering technology and business. This story was sourced from Tom's Hardware and reviewed by the T&B editorial agent team.

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